This work presents the study results of using inductively coupled plasma(ICP)-reactive ion etching(RIE) for fabricating InSb mesa with CH4/H2/Ar plasma.
利用感应耦合等离子(ICP)反应刻蚀(RIE)进行了InSb阵列芯片台面刻蚀,并利用轮廓仪、SEM及XRD对台面形貌以及刻蚀损伤进行分析。
The effects of Deep Reactive Ion Etching(DRIE) and the backside protecting under the etching silicon on the structure were analyzed.
通过对深度反应离子刻蚀(DRIE)工艺参数的调整,成功地刻蚀出大尺寸、大深宽比的结构释放窗口,释放了最小线宽为2。
Inductively coupled plasma reactive ion etching of InSb photovoltaic detector arrays
InSb阵列探测芯片的感应耦合等离子反应刻蚀研究
Tolerance of ion beam etching on multilayer dielectric thin film reflector for spectrum reshaping
多层介质膜光谱调制反射镜的反应离子束刻蚀误差容限
An Investigation of Reactive Ion Etching for Through Silicon Via Packaging Technology
反应离子刻蚀在穿透硅通孔封装技术中的应用研究
Etch- A process of chemical reactions or physical removal to rid the wafer of excess materials.
蚀刻-通过化学反应或物理方法去除晶圆片的多余物质。
CIM Feedback Control System Design and Implement in Semiconductor Etch Area;
半导体蚀刻计算机集成反馈控制系统设计与应用
Study on the electrode process kinetics of recycle of spent acidic etchant for printed circuit board
印刷电路板酸性蚀刻废液回收工艺中电极反应过程动力学研究
RIE of SiO_2 Nanoparticles and Its Application in Preparation of Silicon Nanopillar Array
二氧化硅纳米颗粒的反应离子刻蚀及其在硅纳米针尖制备中的应用(英文)
etchings, woodcuts, lithographs;
蚀刻、木刻、平版画；
Investigation on Technics and Property of Broadband Infrared Antireflective Sub-wavelength Structures Prepared by RIE on Ge Substrate
锗衬底上反应离子刻蚀制备宽波段红外增透结构的工艺及性能研究
The concern with etching beyond this point should be clear.
刻蚀超越此值的后果应该是清楚的。
A STUDY OF THE PROPERTIES OF ECE RECOIL TRACKS INDUCED BY FAST NEUTRON IN POLYCARBONATE FOILS
聚碳酸酯快中子反冲径迹的电化学蚀刻研究
The reaction of the audience was instantaneous.
观众即刻有了反应。
gas discharge etching
气体放电蚀刻[法]
laser engraving, laser etching
激光雕刻，激光蚀刻
a block that has been etched or engraved.
一块被蚀刻或雕刻的板。
APPLICATION OF ION BEAM MILLING TECHNIQUE TO JOSEPHSON DEVICE TECHNOLOGY
离子束刻蚀技术在约瑟夫逊器件工艺中的应用
Investigation of Inductively Coupled Fluorocarbon Plasma and Etching of SiO_2;
碳氟感应耦合等离子体及其SiO_2介质刻蚀研究
The Study of the Etching Process with RF Cold Plasma at Atmospheric-pressure;
常压射频冷等离子体在刻蚀工艺中的应用研究