The Cr-Cu/ Al 2O 3/ZnS /Ag films grown on glass substrate by the way of vacuum sputtering, the fabrication technology on electron emission properties are studied, and the optimum technical parameter is obtained.
介绍了一种用于场致发射显示的平面多层膜电子发射结构的制作过程 ,采用真空溅射的方法镀制玻璃衬底 Cr-Cu Al2 O3 ZnS Ag结构的平面电子源 ,对其发射性能进行了论述 ,并取得优化发射性能的工艺参
In this paper, with the technology of vacuum sputter, pure aluminum corrosion sensitive film was directly deposited on the core of optical fiber with its clad removed.
用清水反复清洗浸蚀后的光纤,晾干后进行真空溅射镀膜。
The technics of fabricating pure Al corrosion sensing film with vacuum sputter were groped.
探索了利用真空溅射技术在光纤纤芯上沉积纯铝腐蚀敏感膜的工艺。
A Pratical Method of Removing the Projective Distortion;
一种消除图像射影失真的实用方法
The reason for Projective distortion that the amplification ratio is not constant but has nonlinear relation with pitch and tilt angles and field of view of cameras was found out.
通过分析该模型中物与像的对应关系,得出了射影失真产生的根源是光学系统放大率的不恒定,并与相机的外参数:倾角及视场的大小有着非线性的变化关系。
In this paper,a realization scheme for RF simulation of the target signal in a frequency agile radar is discussed.
介绍了一种用于非相参捷变频体制导弹末制导雷达目标信号射频仿真的模拟器。
We made the research on the errors, which provided important reference to error analysis of RF simulation system.
详细分析了二元阵定向原理 ,推导出定向公式 ,对原理误差进行了研究 ,为射频仿真系统误差分析提供了重要的依据。
A near-distance target was simulated by RF simulation technology,in which the fuze\'s emission signal is delayed with fiber-delay-line for whole coding period.
并用射频仿真方法模拟近距离目标,其中采用光纤延迟线将引信信号延时一个编码周期实现零距离延迟,验证引信真实灵敏度特性,最后给出了结论。
Comparing the data between firing simulation and the calculation specification of recoil system,the results show that the virtual prototype is practical and it is a feasible approach to the dynamic analysis through the virtual prototype.
利用fortran语言将内弹道计算的发射时火药气体压力以及复进机、驻退机力编为外挂程序模块施加于模型,然后将射击仿真时的后坐运动与反后坐说明书的数据进行对比,结果证明该虚拟样机与火炮射击后坐的运动情况基本一致,符合工程分析的要求。
Electrochemical Performance Research on Sn and Sn/C Intercalation Lithium Film Materials Prepared by Vacuum Sputtering;
锡和锡碳嵌锂薄膜材料的真空溅射制备及电化学性能研究
Vacuum sputter deposition techniques were developed to achieve high Hc , with high Ms materials epitaxially grown on Cr underlayers.
使用真空溅射方法在Cr底层上沉积高矫顽力、高饱和磁化强度的磁记录介质。
Reflectance of Ir Layer in Vacuum Ultraviolet Wavelength Region Deposited by Ion Beam Sputtering
离子束溅射沉积Ir膜真空紫外反射特性研究
Study on Temperature Control System of High Vacuum Magnetron Sputtering Machine;
高真空磁控溅射镀膜机温度控制系统的研究
Preparation of Uranium Film by Ultra High Vacuum Magnetron Sputtering and Its Characterization
超高真空磁控溅射法沉积铀薄膜及其表面状态
Research of the Vacuum Magnetron Sputtering Deposition Equipment and its Prdcess
真空磁控溅射镀膜设备及工艺技术研究
The enterprise deyang sunlight electric co., ltd. has special knowledge within the ranges Roasting, Thyristor and Vacuum coating as well as Sputtering.
公司专业从事晶闸管可控硅整流器、烤架以及真空镀膜和溅射业务。
Design of the Control System of Vacuum Magnetron Sputtering & Coating Equipment Based on Industrial Computer and PLC
基于工控机和PLC的真空磁控溅射镀膜设备控制系统设计
Effect of the background vacuum degree on the properties of the C/Cr coating deposited by non-equilibrium magnetron sputtering
本底真空度对非平衡磁控溅射C/Cr复合镀层性能的影响
Study On Expert PID Temperature Control in High Vacuum Magnetron Sputtering Coating Machine
专家PID温度控制在高真空磁控溅射镀膜机中的应用研究
The dry plating method is a method for deposition of a metal on the surface of polymer material under vacuum and includes sputtering method, vapor deposition, vacuum deposition, etc.
干镀是一种在真空下在聚合物表面沉积金属的方法，包括溅射、气相沉积、真空沉积等。
High-quality flow controller, pressure transducer, pressure gauge ect. for vacuum equipment, coating equipment and semiconductor equipment.
用于真空镀膜、空溅射、导体制造设备的质量流量计、力传感器、力表及相关产品。
Simulation of Proportion Integration Differentiation Neural Network Control of Reactive Sputtering
反应溅射的PID神经网络控制仿真
The "OUSLAN" spurting film productive technology is in progress in a very big vacuum chamber , very low ina ctive gas of pressure in the environment and under electric energy effect.
溅射膜生产工艺在一个很大的真空室、压力很低的惰性气体环境中及电能作用下进行。
Use of Ion Sputter Coating to Prepare the Gold Deposited TiO_2 Nanofiber Photocatalyst and the Photocatalytic Degradation of Acetaldehyde
真空离子溅射法制备TiO_2:Au复合纳米纤维新型光催化剂及其降解乙醛性能研究
Study of Structure and Tribological Properties in Vacuum of MoS_2-Ti Composite Coatings Deposited by Unbalanced Magnetron Sputtering system
非平衡磁控溅射沉积MoS_2-Ti复合薄膜的结构与真空摩擦磨损性能研究
Design of Electrical Control System on a Magnetic Scattering Vacuum Three-target Film Coating Machine;
三靶磁溅式真空镀膜机电气控制系统的研究
sputtered film disk
溅射膜盘 -全称 :溅射薄膜磁盘