Study of mechanical polishing of CVD diamond thick films;
CVD金刚石厚膜的机械抛光研究
Development of the Rotator Special for Autoclave Body Polish;
釜体抛光专用转罐机的研制
The Design of a Self-oscillating Abrasive Water Jet Polisher of Economy Type;
经济型自激振荡磨料射流抛光机设计
The design of the grinding liquid pulse shot flow polisher;
磨液脉冲射流抛光机设计
Ultrasonic is applied in slider lapping.
在硬盘磁头抛光中加入超声波,可以提高材料去除率、降低表面粗糙度值、减小极尖沉降。
The thickness of the slurry film in one lapping process with a kind of texturing plate surface was calculated as an example.
根据运动学分析,研究了磁头和抛光盘接触面之间速度场的分布;结合流体力学理论,将抛光盘表面的沟槽视为楔形滑块或阶梯轴承,研究了磁头和抛光盘接触面之间抛光液的流动行为。
It is a contradiction to achieve a high material removal rate and a super smooth surface in lapping of magnetic head.
同时获得高去除率和超光滑平整的表面是硬盘磁头自由磨粒抛光的矛盾,研究自由磨粒抛光材料去除规律可以优化抛光工艺。
Improving of optical polishing machine based on fuzzy control;
基于模糊控制技术的光学抛光机床的改造
According to the analysis of the structure of polishing pad,polishing machine and polishing slurry,the merits of fixed abrasives (FA)CMP were presented.
经过对传统化学机械抛光技术的研究与分析,指出了目前ULSI制造中使用的传统化学机械抛光技术的缺点,通过对固结磨料化学机械抛光中的抛光垫结构、抛光机原理及抛光液的分析,得出了固结磨料化学机械抛光技术的优点,同时还对硅片固结磨料化学机械抛光的缺陷进行了研究。
The tradition optical lens polishing machine existence main axle swinging inertia is big, the rack easy to have the vibration, the complete machine stability inferior serious influence product precision question.
传统光学透镜抛光机存在主轴摆动惯性大,机架易产生振动,整机稳定性差等严重影响产品精度的问题。
Investigation of functions and effects of polishing pad conditioning in chemical mechanical polishing;
化学机械抛光中抛光垫修整的作用及规律研究
The performances of a polishing pad are determined by the type and properties of pad materials, the surface structure and state as well as the conditioning parameters.
抛光垫是化学机械抛光 (CMP)系统的重要组成部分。
According to the analysis of the structure of polishing pad,polishing machine and polishing slurry,the merits of fixed abrasives (FA)CMP were presented.
经过对传统化学机械抛光技术的研究与分析,指出了目前ULSI制造中使用的传统化学机械抛光技术的缺点,通过对固结磨料化学机械抛光中的抛光垫结构、抛光机原理及抛光液的分析,得出了固结磨料化学机械抛光技术的优点,同时还对硅片固结磨料化学机械抛光的缺陷进行了研究。