substrate

1. The substrate is first covered by a mask .
首先在基片上覆盖一个掩膜片。

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2. The device can be utilized on any substrate.
利用该装置可在任何基材上。

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3. Outstanding adhesion to bare steel substrate.
与裸钢的附着力极好。

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4. The substrate is placed into a process chamber.
基板置于处理腔内。

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5. Substrate surface must be clean dry and no oil.
将要施涂的表面必须完全干净、干燥及无油脂。

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6. Many bacteria can thrive upon very simple substrate.
很多细菌在很简单的基质中也能很好地繁殖。

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7. Both substrate and product can inhibit the reaction.
底物和产物对反应有抑制作用。

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8. We shall consider the case of a flat substrate first.
我们首先考虑平面基底的情况。

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9. The substrate must be dry, solid, and free from dust.
墙面基层必需干燥、牢固、无尘埃。

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10. Ability to hide the substrate at a given film thickness.
一定厚度遮盖住基材的能力。

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11. This is to prevent damage to the archaeological substrate.
这是为了防止损坏考古基质。

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12. The substrate type ISFET is a chemically sensitive device.
衬底型ISFET是一种化学敏感器件。

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13. Glass substrate is the key basic material in FPD manufacturing.
玻璃基板是平板显示产业中不可或缺的关键基础材料之一。

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14. The package includes a chip carrier which has a metal substrate.
所述封装包括有金属基片的芯片支座。

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15. Push device is firm, good distance for changing substrate material.
该推动装置设计坚固,推动距离大,方便基材料的穿越。

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16. Set up the substrate well, this is the main part of the non CO2 tank.
底床一定要设置好,这对于无CO2添加的缸来说至关重要。

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17. The rate of substrate change is dependent of substrate concentration.
被酶作用物变化速率取决于被酶作用物的浓度。

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18. In this paper, this new type of SERS substrate activity are discussed.
本文对这种新型SERS活性基底进行了讨论。

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19. At least one trench extends through the body region and the substrate.
至少有一条凹槽延伸穿过体区和衬底。

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20. The gate is disposed on the substrate and straddled the fin structure.
栅极设置于基底衬底上,横跨鳍状结构。

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21. The assessment of energy and metabolic substrate was also made in this.
同时也阐述病人能量代谢与代谢底物的评估。

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22. Introduce the key manufacture technology and control of LTCC substrate.
本文介绍了LTCC基板制造的关键技术和性能控制。

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23. The concentration of substrate was nearly linear with the reaction time.
底物浓度与反应时间存在近似的线性关系。

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24. The substrate packing device comprises a box body and a separation unit.
此基板包装装置包括箱体与分隔单元。

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25. Method of surface treatment, crystal substrate, and semiconductor device.
表面处理方法,晶体基材,和半导体设备。

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26. To produce a sample proof: Lay the substrate out on a smooth flat surface.
要产生一个样本证明:躺着的基板,光洁平整的表面上。

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27. The effects of substrate material and surface roughness on it are studied.
研究了衬底材质及表面粗糙度对薄膜结构的影响。

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28. The method of thin target with thick substrate was used in the experiment.
在实验中采用了薄靶厚衬底新方法。

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29. There is an effect of island decoration near the step of substrate surface.
它们在基底膜表面台阶处有小岛的装饰效应。

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30. This works just as well and you can use the same substrate as we mentioned.
这个工程一样,你可以用同样的我们提到子。

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