In this paper, photoluminescence of ZnO thin films, which were deposited by reactive r.
利用直流射频磁控溅射制备了氧化锌薄膜 ,测量了不同温度下的氧化锌薄膜的光致发光 。
The ZnO thin films are fabricated by electrodeposition on n-type InP wafers at constant potential.
采用电化学沉积方法在n型InP(100)(1016)衬底上制备了氧化锌薄膜。
The vacuum evaporation was used for the deposition of Zinc precursor layers,and ZnO thin films were prepared by oxidizing the precursor in the air in the post treatment of annealing processing at different temperatures.
采用真空蒸发镀膜的方法分别在玻璃和硅片衬底上沉积金属锌前驱体,再在空气中通过不同温度的退火氧化处理制得氧化锌薄膜,主要研究了不同退火温度对氧化锌薄膜光电特性的影响。
Preparation and mechanism of p-type ZnO films formed by modified ion beam enhanced deposition method;
离子束增强沉积制备p型氧化锌薄膜及其机理研究
So it could be used as substrate materials of ZnO films.
ZnWO4单晶的a晶面与氧化锌c晶面晶格匹配很好,是制备氧化锌薄膜的优良衬底。
ZnO films were prepared by pulsed laser deposition on crystal silicon substrate.
在单晶硅衬底上用激光脉冲沉积方法制备了氧化锌薄膜,研究了衬底温度对薄膜结构、形貌和发光性能的影响。
Al-doped ZnO thin films were fabricated on glass substrates by solgel method.
采用溶胶-凝胶工艺在普通玻璃片上制备了掺铝氧化锌薄膜。
N-doped ZnO thin films are grown by plasma-assisted molecular beam epitaxy (P-MBE) on c-plane sapphire (α-Al_2O_3) using NO as oxygen source and nitrogen dopant.
用等离子辅助分子束外延 (P MBE)的方法 ,在蓝宝石c 平面上外延生长了p型氧化锌薄膜。
ZnO thin film was deposited on nucleation side of freestanding diamond film by RF reactive magnetron sputtering.
采用热丝化学气相沉积(CVD)法制备了自支撑金刚石膜,再通过射频磁控溅射法沉积氧化锌薄膜在自支撑金刚石膜上。
A layer of zinc acetate was sprayed on the surface of glass, and then a zinc oxide film as a semiconductor was formed by pyrolysis.
扩展一种和玻璃基体结合力高的化学镀铜技术 ,它在玻璃表面上喷雾覆盖一层醋酸锌 ,然后热解形成半导体氧化锌薄膜 。
ZnO films were prepared on glass substrates by a sol-gel spin-coating method from 3 to 9 layers.
用sol-gel法在玻璃载玻片上旋涂3~9层制备氧化锌薄膜。
In the experiment, reflection spectra of ZnO films, which deposited on Si substrate, were measured.
实验结果表明,氧化锌薄膜在可见光范围内的折射率近似为一常数3。
Using DC reaction sputtering, ZnO films were deposited on Si and quartz substrates, respectively.
采用正入射的方法研究了生长在硅基片上的氧化锌薄膜的反射光谱,测量出氧化锌薄膜的光学吸收边在370nm,所对应的能量值为3 35eV。
Ultraviolet emission property of undoped and Ag doped ZnO films
氧化锌及银掺杂的氧化锌薄膜的紫外发光研究
Znic Oxide Film Growth and Annealing Effcet on Properties of Films;
氧化锌薄膜生长和退火对薄膜质量的影响
Fabrication of ZnO Films by Electrodeposition and Its Properties Research;
氧化锌薄膜的电化学制备和性能研究
The Preparation and Property Study of the Al-atom-doped ZnO Thin Films;
铝原子掺杂氧化锌薄膜的制备与性能
Study on the surface texture mechanism of Al-doped zinc oxide films etched by NH_4Cl aqueous solution
掺铝氧化锌薄膜表面织构机制的研究
Investigation of Structure of Nd-doped ZnO and La-doped ZnO Thin Films
钕、镧掺杂氧化锌薄膜的制备及形貌
Doping mechanism and preparing technology of p-type ZnO
氧化锌薄膜的p型掺杂及其制备方法
N-doped zinc oxide thin films by rf magnetron sputtering
磁控溅射法制备氮掺杂的氧化锌薄膜
Study on Raman Spectra of p-type Semiconductor ZnO thin Films
P型半导体氧化锌薄膜的Raman光谱研究
The Preparation of ZnO Thin Films by Thermal Evaporation and Oxidation and Their Optical and Electrical Properties;
氧化锌薄膜的蒸发氧化制备及其光电特性研究
The Study on Electrochemical Deposition and Property of ZnO Thin Film;
氧化锌薄膜的电化学沉积及其性能研究
Study on Preparation and Photocatalytic Properties of Nanometer ZnO Film and Modified Nanometer ZnO Film;
纳米氧化锌薄膜制备改性及光催化性能研究
Preparation of Porous ZnO Films and Their Photocatalytic Performance
多孔氧化锌薄膜的制备及其光催化性能
Preparation of Super-hydrophobic ZnO Films by Chemical Solution Deposition Method
化学溶液沉积法制备超疏水氧化锌薄膜
The Preparation and Investigation of High-quality Thin Films and Low-dimension Structure of ZnO;
高质量氧化锌薄膜和低维结构的制备及研究
The Growth of High Quality ZnO Thin Films at Low Temperature by PECVD & Study of Its Properties;
低温生长高质量氧化锌薄膜及其特性研究
The Study on Structure and Optical Properties of Nanocrystalline ZnO Thin Films;
纳米氧化锌薄膜的结构和光学特性研究
Study on the Preparation of Al-and Si-doped ZnO Films and Their Properties;
掺铝掺硅氧化锌薄膜的制备工艺及其性能研究