1.Fabrication of Ultra Deep Electrical Isolation Trenches with High Aspect Ratio Using DRIE and Dielectric Refill
用深反应离子刻蚀和介质填充技术制造具有高深宽比的超深电隔离槽
2.Trench Profile Control of Silicon DRIE Process on ICP Tools
ICP体硅深刻蚀中侧壁形貌控制的研究